A new technical paper titled “DECOR: Deep Embedding Clustering with Orientation Robustness” was published by researchers at Oregon State University and Micron Technology. “In semiconductor ...

Semiconductor wafer defect pattern recognition and classification is a crucial area of research that underpins yield enhancement and quality assurance in microelectronics manufacturing. The discipline ...

Each of the inspection systems in the new portfolio features seamless connectivity to the recently introduced eDR-7000 e-beam wafer defect review system. With outstanding sensitivity and review speed, ...

New research paper titled “Semiconductor Defect Detection by Hybrid Classical-Quantum Deep Learning” by researchers at National Tsing Hua University. “With the rapid development of artificial ...

MILPITAS, Calif., Dec. 10, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced two new products: the PWG5™ wafer geometry system and the Surfscan® SP7XP wafer defect inspection system.

Microelectronic device manufacturers can use the IRIS wafer-inspectionsystem from SemiProbe to detect flaws in the wafer circuit pattern, aswell as contamination or process damage. Depending on the ...

As semiconductor manufacturers aim to produce devices at the 5-nanometer node, the ability to find tiny defects created inadvertently during the fabrication process becomes harder. In addition, there ...

What is the Market Size of Wafer Defect Inspection System? BANGALORE, India, Dec. 16, 2025 /PRNewswire/ -- In 2024, the global market size of Wafer Defect Inspection System was estimated to be worth ...

The table shows the revenues for KLA across its major segments from FY2020 to FY2023 based on prorated Q1 and Q2 revenues. The company’s Semi Process segment encompasses its Wafer Inspection and ...

Applied is working with all leading-edge logic chipmakers on a growing number of applications for its Sculpta ® pattern-shaping technology Introducing innovative new etch systems, CVD patterning films ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.